PROJECTION EXPOSURE APPARATUS AND METHOD FOR MEASURING A PROJECTION LENS

Microlithographic projection exposure apparatus (100), having a projection lens (150) for imaging an object plane (155) onto an image plane (156), wherein an immersion liquid is at least temporarily provided during operation of the projection exposure apparatus (100) between the projection lens (150...

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Bibliographische Detailangaben
Hauptverfasser:	HEMPELMANN UWE, SCHLEICHER FRANK, SCHADT FRANK, FOCA EUGEN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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