Flexible efficient PECVD (Plasma Enhanced Chemical Vapor Deposition) special gas groove and use method thereof

The invention provides a flexible efficient PECVD (Plasma Enhanced Chemical Vapor Deposition) special gas groove and a use method thereof. The special gas groove comprises a left chamber 4 and a rightchamber 7, wherein a left rolling shaft 8 is arranged in the left chamber 4, and a right rolling sha...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: GENG XIAOPI, YANG RUICHEN, FAN ZHIDONG, WANG FENG, WU CUIPING
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The invention provides a flexible efficient PECVD (Plasma Enhanced Chemical Vapor Deposition) special gas groove and a use method thereof. The special gas groove comprises a left chamber 4 and a rightchamber 7, wherein a left rolling shaft 8 is arranged in the left chamber 4, and a right rolling shaft 5 is arranged in the right chamber 7; a metal sheet 1 is arranged between the left rolling shaft8 and the right rolling shaft 5 in a coiling manner, and the metal sheet 1 coils the outer side of a reaction chamber 10; a special gas hole 2 is formed in the metal sheet 1 and is corresponding to aspecial gas hole in the reaction chamber 10. 本发明提供了种柔性高效PECVD特气槽及其使用方法,特气槽包括左仓室4、右仓室7,所述左仓室4内设有左滚轴8,所述右仓室7内设有右滚轴5,所述左滚轴8以及所述右滚轴5之间缠绕着金属薄片1,所述金属薄片1围绕在反应腔室10的外侧,所述金属薄片1上设有特气孔2,所述特气孔2与所述反应腔室10上的特气孔气路对应。