Flexible efficient PECVD (Plasma Enhanced Chemical Vapor Deposition) special gas groove and use method thereof
The invention provides a flexible efficient PECVD (Plasma Enhanced Chemical Vapor Deposition) special gas groove and a use method thereof. The special gas groove comprises a left chamber 4 and a rightchamber 7, wherein a left rolling shaft 8 is arranged in the left chamber 4, and a right rolling sha...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a flexible efficient PECVD (Plasma Enhanced Chemical Vapor Deposition) special gas groove and a use method thereof. The special gas groove comprises a left chamber 4 and a rightchamber 7, wherein a left rolling shaft 8 is arranged in the left chamber 4, and a right rolling shaft 5 is arranged in the right chamber 7; a metal sheet 1 is arranged between the left rolling shaft8 and the right rolling shaft 5 in a coiling manner, and the metal sheet 1 coils the outer side of a reaction chamber 10; a special gas hole 2 is formed in the metal sheet 1 and is corresponding to aspecial gas hole in the reaction chamber 10.
本发明提供了种柔性高效PECVD特气槽及其使用方法,特气槽包括左仓室4、右仓室7,所述左仓室4内设有左滚轴8,所述右仓室7内设有右滚轴5,所述左滚轴8以及所述右滚轴5之间缠绕着金属薄片1,所述金属薄片1围绕在反应腔室10的外侧,所述金属薄片1上设有特气孔2,所述特气孔2与所述反应腔室10上的特气孔气路对应。 |
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