Resistance-reduction slurry injecting structure for rectangular tunnel segment

The invention provides a resistance-reduction slurry injecting structure for a rectangular tunnel segment. The rectangular tunnel segment comprises a top plate and a bottom plate which are supported by two side walls, an up-down communicating upper slurry injecting hole is formed in the top plate fr...

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Bibliographische Detailangaben
Hauptverfasser: ZHAO GUOMING, YANG HONGJUN, ZHAO LIYONG, HE SHANNING, RAN JINGPENG, ZHENG LIJUN, CUI XIANHUI, GUO SHAOBO, ZHU YONGSHUAI, YANG JUN, CAO WEIMING, WANG JINBO, WANG HONGXING, WANG HEKUN, DOU XIAOTIAN, WANG ZHIYING, YAO SHUCHUN, LI KEKE, LYU DONGYANG, TANG RUYU
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a resistance-reduction slurry injecting structure for a rectangular tunnel segment. The rectangular tunnel segment comprises a top plate and a bottom plate which are supported by two side walls, an up-down communicating upper slurry injecting hole is formed in the top plate from the lower bottom face to the upper surface, and an upper left slurry injecting channel which is inclined backwards is formed in the position, in the upper surface of the top plate, of the upper slurry injecting hole in the left side direction. According to the resistance-reduction slurry injecting structure for the rectangular tunnel segment, the upper slurry injecting hole is formed in the top plate, the two slurry injecting channels which are inclined backwards are formed in the position, in the upper surface of the top plate, of the upper slurry injecting hole, and upper slurry outlet holes communicating with the upper surface of the top plate are formed in the two slurry injecting channels which are inclined