SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING A LITHOGRAPHIC APPARATUS

A substrate table (WT) configured to support a substrate (W) for exposure in an immersion lithographic apparatus, the substrate table comprising: a support body (30) having a support surface (31) configured to support the substrate; and a cover ring (130) fixed relative to the support body and confi...

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Hauptverfasser:	NAKIBOGLU GUNES, BALTIS COEN HUBERTUS MATHEUS, VIEYRA SALAS JORGE ALBERTO, VAN SOMMEREN DAAN DANIEL JOHANNES ANTONIUS, MELMAN JOHANNES CORNELIS PAULUS, VAN DE VIJVER YURI JOHANNES GABRIEL, GATTOBIGIO GIOVANNI LUCA, STALS WALTER THEODORUS MATHEUS, POLET THEODORUS WILHELMUS, ZDRAVKOV ALEKSANDAR NIKOLOV, BUDDENBERG HAROLD SEBASTIAAN, VAN LIESHOUT JOSEPHUS PETER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A substrate table (WT) configured to support a substrate (W) for exposure in an immersion lithographic apparatus, the substrate table comprising: a support body (30) having a support surface (31) configured to support the substrate; and a cover ring (130) fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface (60); wherein at least a portion (61) of the upper surface is configured so as to alter the stability of a meniscus (17) of immersion liquid when moving along the upper surface towards the substrate. 种衬底台(WT)配置成支撑衬底(W)以在浸没光刻设备中进行曝光，所述衬底台包括：支撑体(30)，所述支撑体具有被配置成支撑所述衬底的支撑表面(31)；和盖环(130)，所述盖环相对于所述支撑体是固定的并且被配置成在平面视图中看围绕支撑在所述支撑表面上的所述衬底，其中所述盖环具有上表面(60)；其中所述上表面的至少部分(61)被配置成以便在沿着所述上表面朝向所述衬底移动时改变浸没液体的弯液面(17)的稳定性。