Head-face symmetry measuring device and system

The invention provides a head-face symmetry measuring device and system; the head-face symmetry measuring device comprises a head band and a philtrum line positioning rod, wherein the head band is provided with two graduation segments which are of center symmetry about the midpoint of the head band;...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BIE ZHENG, GE MIN, NI FENG, SONG NAN, LI CHUN, YU DONG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a head-face symmetry measuring device and system; the head-face symmetry measuring device comprises a head band and a philtrum line positioning rod, wherein the head band is provided with two graduation segments which are of center symmetry about the midpoint of the head band; the philtrum line positioning rod is connected directly or indirectly with the midpoint of the headband; in addition, the philtrum line positioning rod is perpendicular to the head band. 本发明提供了种头面部对称性测量装置及系统,该头面部对称性测量装置包括头部套带和人中线定位杆;其中,所述头部套带上设置有两个刻度段,两个所述刻度段以所述头部套带的中点对对称中心对称设置;所述人中线定位杆与所述头部套带的中点直接或间接连接;并且,所述人中线定位杆与所述头部套带垂直设置。