Embossing method capable of reducing deformation of elastomeric stamp
The invention discloses an embossing method capable of reducing deformation of an elastomeric stamp. The embossing method comprises the following specific steps of: (1) preparing the elastomeric stamp, an embossing substrate and embossing glue; (2) applying external force for embossing the stamp ont...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses an embossing method capable of reducing deformation of an elastomeric stamp. The embossing method comprises the following specific steps of: (1) preparing the elastomeric stamp, an embossing substrate and embossing glue; (2) applying external force for embossing the stamp onto the embossing substrate coated with the embossing glue; (3) removing external force, and waiting for certain time for returning the elastomeric stamp to the original shape; (4) curing the embossing glue through ultraviolet light; and (5) separating the stamp from the embossing glue. According to the embossing method disclosed by the invention, external force is removed before glue which is filled into the seal is cured by ultraviolet-light radiation, so that the elastomeric stamp is automatically returned to the original shape under a non-pressure condition, the glue is filled into a cavity of the original stamp, copying precision can be improved, and thickness distribution uniformity of aresidual layer is improv |
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