Metal/dielectric ultra-wideband absorbing film and production method thereof

The invention relates to a metal/dielectric ultra-wideband absorbing film. The metal/dielectric ultra-wideband absorbing film comprises a substrate, a first film and a second film which are sequentially disposed from bottom to top, the first film (2) is a metal/dielectric film stack formed by alternately arranging low-refractive index dielectric films L and high-absorption metal films H, and one side, in contact with the substrate, of the first film is the low-refractive index dielectric film L, and the second film is a single-layer low-refractive index dielectric antireflection film AR. Compared with the prior art, the method omits a traditional thick-layer precious metal substrate, increases the adhesion and the firmness between the film and the substrate, adopts a novel material selection process, realizes an absorption bandwidth of about 7 [mu]m at 400-7000 nm, and makes the obtained film have an average absorption rate of above 92%. 本发明涉及种金属/介质超宽带吸收薄膜及其制备方法，所述金属/介质超宽带吸收薄膜包括由下而上依次设置的基板、第薄膜和第二薄膜，所述第薄膜(2)为由