Substrate processing apparatus and substrate holding device

The invention provides a substrate processing apparatus and a substrate holding device. A plate-like base of a substrate holder has an upper surface perpendicular to a central axis. A supporter is disposed circumferentially around the central part of the base and protrudes upward from the upper surface of the base to support the lower surface of a substrate. A flexible seal is disposed around theentire periphery of the supporter. An upper edge portion of the seal is located above the supporter. When the substrate holder adsorbs a substrate, gas present between the base and the substrate is sucked through a suction port with the upper edge portion of the seal being in contact with the lower surface of the substrate. This allows the substrate to approach the base and come in contact with the supporter while making the seal bend down. As a result, even if there is a warp in a substrate, the substrate can be held suitably. 本发明提供种基板处理装置及基板保持装置。基板保持部的板状的基部具有与中心轴垂直的上表面。支承部在基部的中央部的周围呈周状地配置，并从基部的上表面向上方突出。支承部用于支承基板的下表面