SUBSTRATE PROCESSING APPARATUS AND METHOD FOR ASSEMBLING TUBE ASSEMBLY

The present invention comprises: a tube assembly, having an internal space for processing a substrate formed therein, which is assembled by laminating a plurality of laminates; a substrate holder forsupporting a plurality of substrates in multiple stages in the internal space of the tube assembly; a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KIM JUN, YOO CHA YOUNG, PARK KYUNG SEOK, KIM YONG KI, JUNG BONG JU, CHOI KYU JIN, JE SUNG TAE, KU JA DAE
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The present invention comprises: a tube assembly, having an internal space for processing a substrate formed therein, which is assembled by laminating a plurality of laminates; a substrate holder forsupporting a plurality of substrates in multiple stages in the internal space of the tube assembly; a gas supply unit, installed at one side of the tube assembly, for supplying a process gas to each of the plurality of substrates in the internal space; and an exhaust unit connected to the tube assembly to exhaust the process gas supplied to the internal space. The present invention may provide a uniform amount of the process gas to the upper surface of the substrates by inducing laminar flow. 本发明包括:套管组合件,其具有内部空间,所述内部空间用于处理形成于其中的衬底,所述衬底是通过层压多个层压板组装;衬底固持器,其用于以多级方式将多个衬底支撑在所述套管组合件的所述内部空间中;气体供应单元,其安装在所述套管组合件的侧,以用于将处理气体供应到所述内部空间中的所述多个衬底中的每个;以及排气单元,其连接到所述套管组合件以排出供应到所述内部空间的所述处理气体。本发明可以通过诱导层流而将均量的所述处理气体提供到所述衬底的上表面。