FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS

The present invention relates to a lithographic immersion apparatus comprising a fluid handling structure and a device manufacturing method. In an embodiment, the fluid handling structure is configured to confine immersion fluid to a region and comprises a gas knife system, the gas knife system comprising passages each having an exit, the passages comprising a plurality first passages having a plurality of corresponding first exits, and a plurality of second passages having a plurality of corresponding second exits, wherein at least one first passage and at least one second passage are configured such that the stagnation pressure of gas exiting the first exit is greater than the stagnation pressure of gas exiting the second exit, and the plurality of first passages and the plurality of second passages are intermingled and arranged in a line such that the first exits and the second exits form a side of a shape in plan view. In an embodiment, the fluid handling structure is configured toconfine immersion fluid