Semiconductor structure and method of fabricating the same
The present disclosure provides a semiconductor structure and a method of fabricating the same. The semiconductor structure includes a first surface and a first sidewall; a waveguide including a firstportion disposed along the first surface and a second portion coupled to the first portion along the...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present disclosure provides a semiconductor structure and a method of fabricating the same. The semiconductor structure includes a first surface and a first sidewall; a waveguide including a firstportion disposed along the first surface and a second portion coupled to the first portion along the first sidewall, and a reflector located above the waveguide. The reflector comprises a reflectivesurface, the reflective surface is positioned between the first portion and the second portion and is configured to guide light from the first portion to the second portion and vice versa.
本公开提供种半导体结构及其制造方法。半导体结构包含第表面与第侧壁;波导,包含沿着该第表面配置的第部分,以及沿着该第侧壁且耦合该第部分的第二部分;以及反射件,位于该波导上方,其中该反射件包含反射表面,位于该第部分与该第二部分之间且经配置以将光自该第部分导引至该第二部分,反之亦然。 |
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