Wafer substrate and ion implantation equipment

Disclosed are a wafer substrate and ion implantation equipment. The wafer substrate comprises a wafer carrying platform, a plurality of detection pins, and a displacement sensor, wherein multiple mounting holes are formed in the wafer carrying platform; the multiple detection pins are positioned in the respective mounting holes and can move up and down in a direction perpendicular to the surface of the wafer carrying platform; in a wafer-free state, the first ends of the detection pins are higher than the surface of the wafer carrying platform; in a wafer state, the detection pins are pressedby the wafer to move downwards; and the displacement sensor is coupled with the multiple detection pins, and is suitable for detecting the downward movement distances of the multiple detection pins inthe wafer state, and determining that the wafer position is abnormal when the downward movement distance of at least one detection pin is smaller than a preset threshold value. By virtue of the scheme, the precision and produ