Method for increasing fused quartz damage threshold based on inertia ion implantation method

The invention discloses a method for increasing fused quartz damage threshold based on an inertia ion implantation method, comprising the following specific operation procedure: washing a fused quartzelement after chemical polishing with deionized water, and putting the element into absolute ethyl a...

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Hauptverfasser: ZU XIAOTAO, XIANG XIA, TIAN CHENGXIANG, LI BO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a method for increasing fused quartz damage threshold based on an inertia ion implantation method, comprising the following specific operation procedure: washing a fused quartzelement after chemical polishing with deionized water, and putting the element into absolute ethyl alcohol for ultrasonic cleaning; after cleaning of the element is completed, performing etching treatment on the element with an HF-NH4F buffer solution, and then washing the etched element with deionized water and absolute ethyl alcohol in sequence; finally performing ion implantation treatment onthe element by using an energy-containing inertia ion beam with energy of 10keV-50keV, wherein the injection amount is 1*1016ions/cm -5*1017ions/cm . By adopting the method disclosed by the invention, the technical problem in a conventional method that a pressure stress layer is hard to form on the surface of fused quartz can be effectively solved, so as to further increase the laser damage threshold of the element. 本发明公开了