Etching machine for single crystal sample wafer

The invention discloses an etching machine for a single crystal sample wafer. The etching machine for the single crystal sample wafer comprises a mechanical hand, an etching process tank and a cleaning water tank; the mechanical hand is provided with a horizontal moving mechanism, a vertical moving...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BIAN YONGZHI, ZHANG LIANG, CAI LIYAN, CHENG FENGLING, NING YONGDUO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses an etching machine for a single crystal sample wafer. The etching machine for the single crystal sample wafer comprises a mechanical hand, an etching process tank and a cleaning water tank; the mechanical hand is provided with a horizontal moving mechanism, a vertical moving mechanism and a sucking disc rotating mechanism; and the etching process tank is composed of a corrosion platform with through holes, a liquid mixing tank with a temperature-control coil pipe, a corroding agent overflow circulation system and an air discharging system arranged around the etching process tank. The etching machine for the single crystal sample wafer provided by the invention can perform surface chemical etching processing on the single crystal sample wafer; in the etching process,the temperature of a corroding agent is stably controlled, the sample wafer rotates at a constant speed, and the corroding agent uniformly contacts with the sample wafer, so that corrosion removal ofthe surface of the sample