Processing method of photoresist template aiming at PDMS (Polydimethylsiloxane) chip transfer printing

The invention discloses a processing method of a photoresist template aiming at a PDMS (Polydimethylsiloxane) chip transfer printing. A manner of increasing one layer of photoresist whole transition layer with the thickness of 5 to 10mum between a photoresist microstructure and a silicon chip is ado...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHANG WENJIE, FENG CHANGXI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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