Processing method of photoresist template aiming at PDMS (Polydimethylsiloxane) chip transfer printing

The invention discloses a processing method of a photoresist template aiming at a PDMS (Polydimethylsiloxane) chip transfer printing. A manner of increasing one layer of photoresist whole transition layer with the thickness of 5 to 10mum between a photoresist microstructure and a silicon chip is adopted so that the adhesion capability between the photoresist microstructure and the silicon chip isimproved; the whole body of the photoresist template is hydrophobic and is easy to de-mold; the photoresist microstructure is arranged on a whole piece of the photoresist transition layer, so that thestability of the microstructure is greatly improved. The service life of the PDMS transfer printing chip is dozens of times, even hundreds of times higher than that of a conventional template; the preparation efficiency of PDMS chips is improved and the preparation cost of the chip is reduced; resource consumption is reduced and the possibility is provided for mass production of the PDMS chips. 本发明公开了种针对PDMS芯片转印的光刻胶模板加工方法