SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE

In parallel with a lower-side scrub cleaning step in which a brush is contacted with a lower surface inclined portion of a substrate, a center-side spray cleaning step is performed in which, while a plurality of liquid droplets are being caused to collide with an upper surface of the substrate, the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ISHII JUNICHI, TSUDA SHOTARO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:In parallel with a lower-side scrub cleaning step in which a brush is contacted with a lower surface inclined portion of a substrate, a center-side spray cleaning step is performed in which, while a plurality of liquid droplets are being caused to collide with an upper surface of the substrate, the position of collision of the plurality of liquid droplets with respect to the upper surface of the substrate is moved between the center of the substrate and a location midway across the substrate. Thereafter, in parallel with an upper-side scrub cleaning step in which the brush is contacted with anupper surface inclined portion of the substrate, an outer periphery-side spray cleaning step is performed in which, while a plurality of liquid droplets are being caused to collide with the upper surface of the substrate, the collision position of the plurality of liquid droplets with respect to the upper surface of the substrate is moved between the location midway across the substrate and the outer periphery of the sub