Tetraethylparacyclophane molecular-level dressing-type coating material and application thereof
The invention discloses a tetraethylparacyclophane molecular-level dressing-type coating material shown as a structural formula I and the application thereof. A protective film formed by the tetraethylparacyclophane molecular-level dressing-type coating material is uniform in thickness, is compact,...
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| creator | MICHAEL ZIGENG CHANG ZHANG YUJIE JIN WENCONG SONG HUACAN ZHAN ZHIMIN LYU LIXIAN |
| description | The invention discloses a tetraethylparacyclophane molecular-level dressing-type coating material shown as a structural formula I and the application thereof. A protective film formed by the tetraethylparacyclophane molecular-level dressing-type coating material is uniform in thickness, is compact, pore-free, transparent and stress-free and is excellent in electrical insulation and protection, hasgood physical and mechanical properties, and is low in friction coefficient and good in solvent resistance and acid and alkali resistance; the tetraethylparacyclophane molecular-level dressing-type coating material is wide in application, has a clear application prospect in the fields of MEMS, electronic industry, microelectronics and optical waveguides, is used as passivating, protecting, lubricating coating and the like in the field of MEMS, is used as a high-purity passivating layer and a dielectric layer for hybrid circuit insulation and isolation protection in the fields of microelectronics and semiconductors, a |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN107986934A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN107986934A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN107986934A3</originalsourceid><addsrcrecordid>eNqNijEKwkAQRdNYiHqH8QABJaJJKUGxskofhs2PCUx2h91RyO1N4QGsHo_31lnbwCLDhlmUI7vZSdCBPWgKAvcWjrngA6EuIqXRv3KbFeQC2yI0sSGOLMS-I1aV0S0heLIBEaHfZqueJWH34ybb329N_cihoUVSdvCwtn4eD5eqPFfF6Vr883wBV8Y-cw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Tetraethylparacyclophane molecular-level dressing-type coating material and application thereof</title><source>esp@cenet</source><creator>MICHAEL ZIGENG CHANG ; ZHANG YUJIE ; JIN WENCONG ; SONG HUACAN ; ZHAN ZHIMIN ; LYU LIXIAN</creator><creatorcontrib>MICHAEL ZIGENG CHANG ; ZHANG YUJIE ; JIN WENCONG ; SONG HUACAN ; ZHAN ZHIMIN ; LYU LIXIAN</creatorcontrib><description>The invention discloses a tetraethylparacyclophane molecular-level dressing-type coating material shown as a structural formula I and the application thereof. A protective film formed by the tetraethylparacyclophane molecular-level dressing-type coating material is uniform in thickness, is compact, pore-free, transparent and stress-free and is excellent in electrical insulation and protection, hasgood physical and mechanical properties, and is low in friction coefficient and good in solvent resistance and acid and alkali resistance; the tetraethylparacyclophane molecular-level dressing-type coating material is wide in application, has a clear application prospect in the fields of MEMS, electronic industry, microelectronics and optical waveguides, is used as passivating, protecting, lubricating coating and the like in the field of MEMS, is used as a high-purity passivating layer and a dielectric layer for hybrid circuit insulation and isolation protection in the fields of microelectronics and semiconductors, a</description><language>chi ; eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; ADHESIVES ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; CORRECTING FLUIDS ; DYES ; FILLING PASTES ; INKS ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC CHEMISTRY ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; POLISHES ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2018</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180504&DB=EPODOC&CC=CN&NR=107986934A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180504&DB=EPODOC&CC=CN&NR=107986934A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MICHAEL ZIGENG CHANG</creatorcontrib><creatorcontrib>ZHANG YUJIE</creatorcontrib><creatorcontrib>JIN WENCONG</creatorcontrib><creatorcontrib>SONG HUACAN</creatorcontrib><creatorcontrib>ZHAN ZHIMIN</creatorcontrib><creatorcontrib>LYU LIXIAN</creatorcontrib><title>Tetraethylparacyclophane molecular-level dressing-type coating material and application thereof</title><description>The invention discloses a tetraethylparacyclophane molecular-level dressing-type coating material shown as a structural formula I and the application thereof. A protective film formed by the tetraethylparacyclophane molecular-level dressing-type coating material is uniform in thickness, is compact, pore-free, transparent and stress-free and is excellent in electrical insulation and protection, hasgood physical and mechanical properties, and is low in friction coefficient and good in solvent resistance and acid and alkali resistance; the tetraethylparacyclophane molecular-level dressing-type coating material is wide in application, has a clear application prospect in the fields of MEMS, electronic industry, microelectronics and optical waveguides, is used as passivating, protecting, lubricating coating and the like in the field of MEMS, is used as a high-purity passivating layer and a dielectric layer for hybrid circuit insulation and isolation protection in the fields of microelectronics and semiconductors, a</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>ADHESIVES</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>FILLING PASTES</subject><subject>INKS</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC CHEMISTRY</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>POLISHES</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2018</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNijEKwkAQRdNYiHqH8QABJaJJKUGxskofhs2PCUx2h91RyO1N4QGsHo_31lnbwCLDhlmUI7vZSdCBPWgKAvcWjrngA6EuIqXRv3KbFeQC2yI0sSGOLMS-I1aV0S0heLIBEaHfZqueJWH34ybb329N_cihoUVSdvCwtn4eD5eqPFfF6Vr883wBV8Y-cw</recordid><startdate>20180504</startdate><enddate>20180504</enddate><creator>MICHAEL ZIGENG CHANG</creator><creator>ZHANG YUJIE</creator><creator>JIN WENCONG</creator><creator>SONG HUACAN</creator><creator>ZHAN ZHIMIN</creator><creator>LYU LIXIAN</creator><scope>EVB</scope></search><sort><creationdate>20180504</creationdate><title>Tetraethylparacyclophane molecular-level dressing-type coating material and application thereof</title><author>MICHAEL ZIGENG CHANG ; ZHANG YUJIE ; JIN WENCONG ; SONG HUACAN ; ZHAN ZHIMIN ; LYU LIXIAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN107986934A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2018</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>ADHESIVES</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>FILLING PASTES</topic><topic>INKS</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC CHEMISTRY</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>POLISHES</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>MICHAEL ZIGENG CHANG</creatorcontrib><creatorcontrib>ZHANG YUJIE</creatorcontrib><creatorcontrib>JIN WENCONG</creatorcontrib><creatorcontrib>SONG HUACAN</creatorcontrib><creatorcontrib>ZHAN ZHIMIN</creatorcontrib><creatorcontrib>LYU LIXIAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MICHAEL ZIGENG CHANG</au><au>ZHANG YUJIE</au><au>JIN WENCONG</au><au>SONG HUACAN</au><au>ZHAN ZHIMIN</au><au>LYU LIXIAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Tetraethylparacyclophane molecular-level dressing-type coating material and application thereof</title><date>2018-05-04</date><risdate>2018</risdate><abstract>The invention discloses a tetraethylparacyclophane molecular-level dressing-type coating material shown as a structural formula I and the application thereof. A protective film formed by the tetraethylparacyclophane molecular-level dressing-type coating material is uniform in thickness, is compact, pore-free, transparent and stress-free and is excellent in electrical insulation and protection, hasgood physical and mechanical properties, and is low in friction coefficient and good in solvent resistance and acid and alkali resistance; the tetraethylparacyclophane molecular-level dressing-type coating material is wide in application, has a clear application prospect in the fields of MEMS, electronic industry, microelectronics and optical waveguides, is used as passivating, protecting, lubricating coating and the like in the field of MEMS, is used as a high-purity passivating layer and a dielectric layer for hybrid circuit insulation and isolation protection in the fields of microelectronics and semiconductors, a</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES FILLING PASTES INKS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES USE OF MATERIALS THEREFOR WOODSTAINS |
| title | Tetraethylparacyclophane molecular-level dressing-type coating material and application thereof |
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