Tetraethylparacyclophane molecular-level dressing-type coating material and application thereof

The invention discloses a tetraethylparacyclophane molecular-level dressing-type coating material shown as a structural formula I and the application thereof. A protective film formed by the tetraethylparacyclophane molecular-level dressing-type coating material is uniform in thickness, is compact, pore-free, transparent and stress-free and is excellent in electrical insulation and protection, hasgood physical and mechanical properties, and is low in friction coefficient and good in solvent resistance and acid and alkali resistance; the tetraethylparacyclophane molecular-level dressing-type coating material is wide in application, has a clear application prospect in the fields of MEMS, electronic industry, microelectronics and optical waveguides, is used as passivating, protecting, lubricating coating and the like in the field of MEMS, is used as a high-purity passivating layer and a dielectric layer for hybrid circuit insulation and isolation protection in the fields of microelectronics and semiconductors, a