Laser device manufacturing method
The invention provides a laser device manufacturing method, which comprises the steps of: growing an active layer on a substrate; etching the active layer and the substrate to form two protruding table facets having a set spacing distance; growing reverse PN junctions on two sides of the two table f...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a laser device manufacturing method, which comprises the steps of: growing an active layer on a substrate; etching the active layer and the substrate to form two protruding table facets having a set spacing distance; growing reverse PN junctions on two sides of the two table facets, and covering the PN junctions on two sides of the active layers of the two table facets; growing a cladding used for light limitation on the PN junctions and the active layers of the two table facets; growing a contact layer used for electrical contact on the cladding; etching the contact layer, the cladding, the reverse PN junctions and the substrate to form isolation trenches on both sides of the two table facets; and manufacturing electrodes to form two laser units. The laser device manufacturing method can improve the yield of laser devices, and reduce the manufacturing cost of the laser devices.
本发明提供种激光器的制造方法,包括:在衬底上生长有源层;对有源层和衬底进行刻蚀,以形成凸出的且具有设定间隔距离的两个台面;在两个台面的两侧生长反向PN结,并使反向PN结覆盖两个台面的有源层的两侧;在反向PN结和两个台面 |
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