Chemical reduction device for silicon wafer

The invention relates to a chemical reduction device for a silicon wafer. The chemical reduction device comprising a box body filled with acid-mixed liquid is characterized in that a horizontal support plate is fixed on the bottom surface of the box body by standing posts; a gas bubbling box is fixed below the horizontal support plate; and matrix type bubble through holes communicated with the gasbubbling box are formed in the horizontal support plate. A bracket is arranged above the horizontal support plate; a rotary lifting basket for clamping a silicon wafer is supported on the bracket andis formed by two circular fixed plates and four lifting basket rods arranged between the two circular fixed plates horizontally, wherein the four lifting basket rods are distributed uniformly by using the central lines of the circular fixed plates as symmetric centers; a plurality of radial annular slots are formed uniformly along the length directions of the lifting basket rods; and the radial annular slots of the four l