Mask and method of manufacturing mask assembly including the same

A mask and a method of manufacturing a mask assembly, the mask including a body, and the body including one end and another end facing each other in a length direction and having a first surface and asecond surface facing each other in a thickness direction; and a pattern region between the one end...

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Bibliographische Detailangaben
Hauptverfasser: KANG, TAEK KYO, MOON, JAE SUK, KIM, MIN JU, GONG, SU CHEOL, KO, JUNG WOO, KANG, MIN GOO, RYU, YOUNG EUN, MIN, SOO HYUN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A mask and a method of manufacturing a mask assembly, the mask including a body, and the body including one end and another end facing each other in a length direction and having a first surface and asecond surface facing each other in a thickness direction; and a pattern region between the one end and the other end, the pattern region including a plurality of pattern holes and a plurality of ribs between the plurality of pattern holes, wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of the body to the one end or the other end of thebody, is 1,000 [mu]m to 4,000 [mu]m. 本申请涉及掩模和制造掩模组件的方法,掩模包括:具有在长度方向上彼此面对的个端部和另端部并且具有在厚度方向上彼此面对的第表面和第二表面的主体,以及处于所述个端部和所述另端部之间的图案区域,图案区域包括多个图案孔和处于多个图案孔之间的多个肋状部,其中掩模的、定义为从与主体的中心相切的平面到主体的个端部或主体的另端部的最短距离的卷曲值是1000μm到4000μm。