Composition for hard mask

The present invention relates to a composition for a hard mask, and more particularly, to a composition for a hard mask comprising a copolymer including repeating units having a specific structure, and a solvent to form a resist underlayer film (hard mask) having excellent solubility and coating uni...

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Bibliographische Detailangaben
Hauptverfasser:	CHOI, HAN YOUNG, YANG, DON SIK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to a composition for a hard mask, and more particularly, to a composition for a hard mask comprising a copolymer including repeating units having a specific structure, and a solvent to form a resist underlayer film (hard mask) having excellent solubility and coating uniformity and excellent crack resistance after forming a hard mask. 本发明提供种硬掩模用组合物，更详细而言，提供通过包含含有特定结构的重复单元的共聚物和溶剂，从而能够形成溶解性和涂布均匀性优异且成膜后耐裂纹性优异的抗蚀剂下层膜(硬掩模)的硬掩模用组合物。