Sintering and anti-light attenuation integrated machine for processing solar silicon wafer
The invention relates to a sintering and anti-light attenuation integrated machine for processing a solar silicon wafer. The sintering and anti-light attenuation integrated machine comprises a sintering furnace and an anti-light attenuation furnace, wherein the sintering furnace comprises a drying s...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a sintering and anti-light attenuation integrated machine for processing a solar silicon wafer. The sintering and anti-light attenuation integrated machine comprises a sintering furnace and an anti-light attenuation furnace, wherein the sintering furnace comprises a drying segment, a sintering segment and a cooling segment; the drying segment is provided with a combustiontower; the combustion tower comprises a combustion box body and the internal space of the combustion box body is sequentially partitioned into a first combustion area, a transition area, a second combustion area and a cooling area through heat insulation walls; the sintering segment comprises a sintering furnace chamber; a first exhaust port is arranged in the top of one end of the sintering furnace chamber, a second exhaust port is arranged in the top of the other end and a third exhaust port is arranged in the top end of the middle; a first organic recovery device is arranged for the first exhaust port; a second org |
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