Reduction furnace and polycrystalline silicon production technology applying same

The invention discloses a reduction furnace. The reduction furnace is used for producing polycrystalline silicon. The reduction furnace comprises a reduction furnace base plate, a reduction furnace bell arranged on the reduction furnace base plate and electrodes which are arranged on the reduction furnace base plate, and the spacing of the electrodes is 80-200 millimeters. The invention further provides a polycrystalline silicon production technology applying the reduction furnace. By means of the reduction furnace, in the polycrystalline silicon production process, the density is increased, the radiation heat among silicon rods is increased, the utilization rate of the heat and materials are increased, and the production cost is lowered. 种还原炉，用于多晶硅生产，包括还原炉底盘、设置在还原炉底盘上的还原炉钟罩及设置在还原炉底盘上的电极，电极的间距在80到200毫米之间。本发明还提供了使用该还原炉的多晶硅生产工艺。本发明的还原炉在多晶硅生产过程中，密度增大，硅棒之间辐射热量增大，热量和物料利用率增加，降低了生产成本。