Film layer detection method, device, and film layer detection system

The invention discloses a film layer detection method, a device, and a film layer detection system, and belongs to the field of panel manufacturing. The film layer detection method is used for detecting at least one film layer arranged on a substrate. The film layer detection method comprises follow...

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Bibliographische Detailangaben
Hauptverfasser: AN YABIN, ZHANG TIEYI, LI YANSHENG, YAN XIAOBAO, QUAN JIYING
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a film layer detection method, a device, and a film layer detection system, and belongs to the field of panel manufacturing. The film layer detection method is used for detecting at least one film layer arranged on a substrate. The film layer detection method comprises following steps: a light source is adopted for irradiation from one side of the substrate provided with the film layer; a film layer image is collected from the side of the substrate provided with the film layer, wherein the film layer image comprises the image of at least one film layer under irradiation; and the type of the upmost film layer is determined based on the brightness distribution of the film layer image. According to the film layer detection method, irradiation treatment of the substrateusing the light source from the side of the substrate provided with the film layer is carried out, after collecting of the film layer image using an image collecting assembly, the type of the upmostfilm layer of at least one