METHOD FOR DOPING SILICON WAFERS

The invention provides a method for doping of silicon wafers (8) using a diffusion oven (1), said diffusion oven (1) having a door (2) for loading and unloading of the silicon wafers (8), an inner volume (6), gas inlets (4) for a reaction gas, a doping gas and a carrier gas and means for modifying t...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	MIHAILETCHI VALENTIN DAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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