Fluorinated strucutured organic film layer
Disclosed herein is an imaging member that includes a substrate, a charge generating layer, a charge transport layer; and an outermost layer comprising a structured organic film (SOF) comprising a fluorinated molecular building block and a hole molecular building block, wherein the fluorinated molec...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Disclosed herein is an imaging member that includes a substrate, a charge generating layer, a charge transport layer; and an outermost layer comprising a structured organic film (SOF) comprising a fluorinated molecular building block and a hole molecular building block, wherein the fluorinated molecular building block is present in the SOF of the outermost layer in an amount of from about 1 weightpercent to about 20 weight percent of the SOF.
本发明披露种成像构件,其包括基底、电荷产生层、电荷传输层;和包含结构化有机膜(SOF)的最外层,所述结构化有机膜(SOF)包含氟化分子构建块和空穴分子构建块,其中所述氟化分子构建块以所述最外层的SOF的约1重量%到约20重量%的量存在于所述SOF中。 |
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