Fluorinated strucutured organic film layer

Disclosed herein is an imaging member that includes a substrate, a charge generating layer, a charge transport layer; and an outermost layer comprising a structured organic film (SOF) comprising a fluorinated molecular building block and a hole molecular building block, wherein the fluorinated molec...

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Bibliographische Detailangaben
Hauptverfasser: MCGUIRE GREGORY M, HU NAN-XING, SAVAGE EDWARD C, HEDRICK ROBERT W, YANG SUXIA
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Disclosed herein is an imaging member that includes a substrate, a charge generating layer, a charge transport layer; and an outermost layer comprising a structured organic film (SOF) comprising a fluorinated molecular building block and a hole molecular building block, wherein the fluorinated molecular building block is present in the SOF of the outermost layer in an amount of from about 1 weightpercent to about 20 weight percent of the SOF. 本发明披露种成像构件,其包括基底、电荷产生层、电荷传输层;和包含结构化有机膜(SOF)的最外层,所述结构化有机膜(SOF)包含氟化分子构建块和空穴分子构建块,其中所述氟化分子构建块以所述最外层的SOF的约1重量%到约20重量%的量存在于所述SOF中。