Device for preparing X-ray nanometer CT metal micro test sample based on local electrochemical etching
The invention discloses a device for preparing a nanometer CT metal micro test sample based on local electrochemical etching. The device comprises a precise position control unit, an electrochemical etching unit and a real-time monitoring unit, wherein the precise position control unit is used for t...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a device for preparing a nanometer CT metal micro test sample based on local electrochemical etching. The device comprises a precise position control unit, an electrochemical etching unit and a real-time monitoring unit, wherein the precise position control unit is used for test sample translation; the electrochemical etching unit is used for precisely etching a test sample to obtain a required structure; the real-time monitoring unit is used for observing the etching state of the sample in real time, and performing collection and imaging on the state. Through the electrochemical local etching, metal microcolumn test samples with the diameter being only dozens or several micrometers and in-situ physical test micro test samples in complicated shapes such as dog boneshapes can be conveniently and fast prepared at low cost; the device is applicable to the preparation of most metal or alloy X-ray nanometer CT test samples. The device provided by the invention solves the sample preparation |
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