Target material assembly and machining method thereof

The invention provides a target material assembly and a machining method thereof. The target material assembly comprises a backing plate, a target billet and an annular adsorption structure, wherein the backing plate comprises a welding area and a marginal area surrounding the welding area; the targ...

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Bibliographische Detailangaben
Hauptverfasser:	PAN JIE, YAO LIJUN, WANG XUEZE, XIANG YUANJUNFU, XU LISHENG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMBINED OPERATIONS DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY OTHER WORKING OF METAL PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING UNIVERSAL MACHINE TOOLS
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Beschreibung
Zusammenfassung:	The invention provides a target material assembly and a machining method thereof. The target material assembly comprises a backing plate, a target billet and an annular adsorption structure, wherein the backing plate comprises a welding area and a marginal area surrounding the welding area; the target billet is welded to the portion, located in the welding area, of the backing plate; and the annular adsorption structure is located in the portion, located in the marginal area, of the backing plate, surrounds the target billet, and comprises an annular adsorption groove, or the annular adsorption structure comprises an annular adsorption groove set, and the annular adsorption groove set comprises at least two annular adsorption grooves which are distributed in a concentric mode at intervals. The target material assembly provided by the invention comprises the annular adsorption structure which is located in the portion, located in the marginal area, of the backing plate, surrounds the target billet, and compris