Etching device
The invention provides an etching device, which comprises an etching chamber, a rotatable bearing platform accommodated in the etching chamber, an upper electrode plate parallel to the surface of the bearing platform, a lower electrode plate and two baffle plates. The lower electrode plate is arrang...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | The invention provides an etching device, which comprises an etching chamber, a rotatable bearing platform accommodated in the etching chamber, an upper electrode plate parallel to the surface of the bearing platform, a lower electrode plate and two baffle plates. The lower electrode plate is arranged on the bearing platform; the upper electrode plate is arranged on the top portion of the etching chamber; and the two baffle plates are arranged between the upper electrode plate and the lower electrode plate, and the baffle plates can move with respect to the bearing platform. The two baffle plates are arranged symmetrically with respect to the axis of the bearing platform; orthographic projection of each baffle plate on the surface of the bearing platform extends from the axis center of the bearing platform along the radius of the rotating trajectory of the bearing platform; and the length of the orthographic projection of each baffle plate is equal to the length of the radius. A substrate comprises a central |
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