Photodynamic antiseptic dressing with antibacterial function, preparation method and application

The invention discloses photodynamic antiseptic dressing with an antibacterial function, a preparation method and an application. The antiseptic dressing is prepared by mixing a photocuring oligomer, an antimicrobial agent, a photosensitizer, a photocuring monomer and water via irradiation film form...

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Bibliographische Detailangaben
Hauptverfasser: LAI BINGSHAN, LIN WANGJUN, LIN QICAN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses photodynamic antiseptic dressing with an antibacterial function, a preparation method and an application. The antiseptic dressing is prepared by mixing a photocuring oligomer, an antimicrobial agent, a photosensitizer, a photocuring monomer and water via irradiation film formation. After the light irradiation film formation, the dressing can form artificial crusta that has an antibacterial property and can protect a wound; and the dressing can block bacterial invasion, reduces a risk of blood poisoning caused by wound infection and accelerates wound incrustation. The dressing is applicable to the various wound such as chronic ulceration, scalding and burning. 本发明公开了种具抗菌功能的光动力学抗菌敷料、制备方法及应用,通过混合光固化寡聚物、抗菌剂、感光剂、光固化单体及水,制备得到种可经由辐射照光成膜之抗菌敷料,该敷料经光照射成膜后可形成具抗菌性可保护伤口之人工痂皮,可阻断细菌的侵入降低伤口感染形成败血症之风险,并加速伤口结痂速度。本发明可应用于慢性溃伤、烫伤、灼伤等各种伤口。