METHOD AND APPARATUS FOR TREATING SUBSTRATE

Provided is a method and apparatus for treating a substrate with a liquid. The substrate treating method comprises a pre-treating step for supplying the treatment liquid containing hydrogen fluoride (HF) to the substrate and treating the substrate before the surface modification step and a surface m...

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1. Verfasser: BANG BYUNG-SUN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Provided is a method and apparatus for treating a substrate with a liquid. The substrate treating method comprises a pre-treating step for supplying the treatment liquid containing hydrogen fluoride (HF) to the substrate and treating the substrate before the surface modification step and a surface modification step for supplying an alkene-based chemical onto a substrate to change the surface of the substrate to a hydrophobic state. As a result, the surface of the substrate is uniform, and generation of particles can be reduced when the substrate is removed. 提供了种用液体处理基板的方法和装置。该基板处理方法包括:用于在表面改性步骤之前将含有氟化氢(HF)的处理液供应到基板并处理基板的预处理步骤;以及用于将烯烃类化学品供应到基板上以将基板的表面改变为疏水状态的表面改性步骤。作为结果,基板的表面均匀,并且当移除基板时,可以减少颗粒的产生。