ISOTOPE PRODUCTION APPARATUS
The invention relates to an isotope production apparatus comprising a cyclotron for producing a particle beam, a shielding encompassing said cyclotron, a target system comprised within said shielding. The shielding comprises a first layer having a hydrogen contents of at least 100 kg/m3 and a second...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to an isotope production apparatus comprising a cyclotron for producing a particle beam, a shielding encompassing said cyclotron, a target system comprised within said shielding. The shielding comprises a first layer having a hydrogen contents of at least 100 kg/m3 and a second layer comprising at least 4900 kg/m3 of material having an atomic number equal to or higher than 26, and at least 29 kg/m3 of hydrogen.
本发明涉及种同位素生产装置,该同位素生产装置包括用于产生粒子束的回旋加速器、包围所述回旋加速器的屏蔽、包括在所述屏蔽内的靶系统。该屏蔽包括具有至少100kg/m3的氢含量的第层以及第二层,该第二层包含至少4900kg/m3的具有等于或高于26的原子序数的材料和至少29kg/m3的氢。 |
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