Chemical polishing agent

The invention discloses a chemical polishing agent which comprises the following components in parts by mass: 10 parts of hydrochloric acid, 10 parts of nitric acid, 2 parts of hydrofluoric acid, 0.1 part of hexadecylpyridinium bromide, 0.3 part of thiourea and 100 parts of deionized water. The chemical polishing agent is excellent in polishing effect, high in polishing speed, simple in formula, readily available in raw materials and low in cost. 本发明公开种化学抛光剂，按质量份数计包括以下组分：10份的盐酸、10份的硝酸、2份的氢氟酸、0.1份的溴代十六烷基吡啶、0.3份的硫脲、100份的去离子水。该化学抛光剂，抛光效果好，抛光速度快，且配方简单，原料易得，成本低。