Assembly of optical system, in particular of microlithographic projection exposure apparatus

The invention relates to an assembly of an optical system, in particular of a microlithographic projection exposure apparatus, said assembly comprising a mirror arrangement (110, 210, 310, 410) which has a plurality of mirror elements (110a, 110b, 210a, 210b, 310a, 310b, 410a, 410b) that can be adjusted independently of each other, and comprising a data and voltage generation unit (120, 220, 320, 420) which generates control data and a supply voltage for controlling an adjustment of each mirror element, wherein the assembly is designed to transmit the control data and/or the supply current from the data and voltage generation unit (120, 220, 320, 420) to the mirror elements (110a, 110b, 210a, 210b, 310a, 310b, 410a, 410b) in an electrically isolated manner. 本发明涉及种光学系统的组合件，特别是微光刻投射曝光设备的组合件，所述组合件包括反射镜布置(110，210，310，410)，其包括多个可相互独立地调节的反射镜元件(110a，110b，210a，210b，310a，310b，410a，410b)，以及包含数据和电压生成单元(120，220，320，420)，其生成控制数据以及供应电压，以控制各反射镜元件的调节，其中组合件设计为将控制数据和/或供应电流从数据和电压生成单元(120，220，320，420)以电隔离的方式传输到反射镜元件(110a，110b，21