COATING SOURCE FOR PRODUCING DOPED CARBON LAYERS

The invention relates to a coating source for physical vapor deposition used for producing doped carbon layers; said coating source is made from powdery components in a sintering process and contains at least 75 mole percent carbon as a matrix material as well as 1 to 25 mole percent of at least one...

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Bibliographische Detailangaben
Hauptverfasser:	WIRLE SABINE, POLCIK PETER, MILLER ULRICH
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a coating source for physical vapor deposition used for producing doped carbon layers; said coating source is made from powdery components in a sintering process and contains at least 75 mole percent carbon as a matrix material as well as 1 to 25 mole percent of at least one doping agent. 本发明涉及种供用于制造掺杂的碳层的物理气相沉积用的涂料源；所述涂料源由粉末组分通过烧结过程制得并包含至少75摩尔％的作为基质材料的碳和1摩尔％至25摩尔％的至少种掺杂剂。