Chamber leak detection method and device

The invention discloses a chamber leak detection method and device. The chamber leak detection method comprises a step of performing a cleaning process on a chamber and then carrying out a plasma reaction; and a step of detecting leak of the chamber by analyzing the plasma reaction. The chamber leak detection method and device can detect chamber leak quickly under the condition that the semiconductor process is not affected. 本发明公开种腔体泄漏检测方法及其装置。腔体泄漏检测方法包括：对所述腔体执行清洗工序后进行等离子体反应的步骤；以及，通过分析所述等离子体反应检测所述腔体的泄漏的步骤。本发明的腔体泄漏检测方法及其装置能够在不影响半导体工序的情况下迅速检测腔体泄漏。