Application of porous frame materials in masks

The invention discloses application of porous frame materials in masks. To solve the problems that a traditional mask matrix is high in irritation and poor in cleaning capacity, an added homogeneous preservative easily causes skin allergy and inflammation, and active matter can not be fully utilized...

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Bibliographische Detailangaben
Hauptverfasser: WENJIE DUAN, ZHENJIE ZHANG, MINGJING ZHUO, JIAXING SUN, YAO CHEN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses application of porous frame materials in masks. To solve the problems that a traditional mask matrix is high in irritation and poor in cleaning capacity, an added homogeneous preservative easily causes skin allergy and inflammation, and active matter can not be fully utilized, the high adsorbability and antibacterial property of the porous frame materials and the property of slowly releasing active ingredients are creatively utilized to solve the problems in the existing mask technology. Meanwhile, through many experiments and long-term exploration, screening criteria of the porous frame materials for different kinds of masks are established, and the interaction mechanism of the porous frame materials and guest molecules is studied according to the material structures. 本申请针对传统面膜基质刺激性强、清洁能力般、添加的均相防腐剂易导致皮肤过敏发炎、活性物质利用不充分等问题,创造性地利用多孔框架材料强吸附性、抗菌性,能够将活性成分缓释的性能将现有面膜技术中的难题解决。同时,经过大量实验和长期摸索,建立了用作不同种类面膜的多孔框架材料的筛选标准,并根据材料结构研究了多孔框架材料与客体分子的相互作用机制。