Selective step coverage for micro-fabricated structures
A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask....
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.
具有两个或更多个层级的开口的荫罩实现了微光学工作台设备内的微加工结构的选择性阶梯覆盖。荫罩包括在荫罩的顶面内的第开口和在荫罩的底面内的第二开口。第二开口与第开口对准并且具有小于第开口的第宽度的第二宽度。第开口与第二开口之间的交叠部在荫罩内形成孔,通过该孔可以发生微光学工作台设备内的微加工结构的选择性涂覆。 |
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