Mask plate loading system and exposure machine

The embodiment of the invention provides a mask plate loading system and an exposure machine, relates to the technical field of display devices, and is capable of reducing the time of replacing a mask plate and improving the efficiency of replacing the mask plate. The mask plate loading system compr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIU HONGXING, LI GUOMING, ZHANG LIANKUN, KANG CHENGMING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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