Gas supply delivery arrangement including a gas splitter for tunable gas flow control

A gas supply delivery arrangement of a plasma processing system for processing a substrate with gases introduced through at least first, second, and third gas injection zones comprises process gas supply inlets and tuning gas inlets. A mixing manifold comprises gas sticks in fluid communication with a process gas supply and tuning gas sticks in fluid communication with a tuning gas supply. A first gas outlet delivers gas to the first gas injection zone, a second gas outlet delivers gas to the second gas injection zone, and a third gas outlet delivers gas to the third gas injection zone. A gas splitter is in fluid communication with the mixing manifold, and includes a first valve arrangement which splits mixed gas exiting the mixing manifold into a first mixed gas supplied to the first gas outlet and a second mixed gas supplied to the second, and/or third gas outlets. 用于利用通过至少第、第二和第三气体注射区域引入的气体处理衬底的等离子体处理系统的气体供应输送装置包括处理气体供应入口和调节气体入口。混合歧管包括与处理气体供应装置流体连通的气体棒和与调节气体供应装置流体连通的调节气体棒。第气体出口将气体输送到第气体注射区域，第二气体出口将气体输送到第二气