Polishing composition, polishing method, and method for manufacturing ceramic component
Provided is a polishing composition which is inexpensive and capable of imparting a high-quality mirror finish to a ceramic. The polishing composition according to the present invention contains abrasive grains, has a pH of 6.0 to 9.0, and is used for polishing a ceramic. 提供廉价且可对陶瓷进行高品质的镜面精加工的研磨用组合物...
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| creator | HISHIDA SHOTA TAMAI KAZUSEI OTSUKI SHINGO ASANO HIROSHI ITO YUUICHI ASAI MAIKO IKEDO TOMOYA |
| description | Provided is a polishing composition which is inexpensive and capable of imparting a high-quality mirror finish to a ceramic. The polishing composition according to the present invention contains abrasive grains, has a pH of 6.0 to 9.0, and is used for polishing a ceramic.
提供廉价且可对陶瓷进行高品质的镜面精加工的研磨用组合物。种研磨用组合物，其含有磨粒，pH为6.0以上且9.0以下，且用于研磨陶瓷。 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN107109196A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN107109196A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN107109196A3</originalsourceid><addsrcrecordid>eNrjZAgPyM_JLM7IzEtXSM7PLcgvzizJzM_TUSiAC-emlmTkp-goJOalQNkKaflFCrmJeaVpicklpUVgvalFibmZyRAz8lLzSngYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbyzn6GBuaGBpaGlmaMxMWoApvk6fw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Polishing composition, polishing method, and method for manufacturing ceramic component</title><source>esp@cenet</source><creator>HISHIDA SHOTA ; TAMAI KAZUSEI ; OTSUKI SHINGO ; ASANO HIROSHI ; ITO YUUICHI ; ASAI MAIKO ; IKEDO TOMOYA</creator><creatorcontrib>HISHIDA SHOTA ; TAMAI KAZUSEI ; OTSUKI SHINGO ; ASANO HIROSHI ; ITO YUUICHI ; ASAI MAIKO ; IKEDO TOMOYA</creatorcontrib><description>Provided is a polishing composition which is inexpensive and capable of imparting a high-quality mirror finish to a ceramic. The polishing composition according to the present invention contains abrasive grains, has a pH of 6.0 to 9.0, and is used for polishing a ceramic.
提供廉价且可对陶瓷进行高品质的镜面精加工的研磨用组合物。种研磨用组合物，其含有磨粒，pH为6.0以上且9.0以下，且用于研磨陶瓷。</description><language>chi ; eng</language><subject>ADHESIVES ; CHEMISTRY ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; DYES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PERFORMING OPERATIONS ; POLISHES ; POLISHING ; TRANSPORTING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170829&DB=EPODOC&CC=CN&NR=107109196A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170829&DB=EPODOC&CC=CN&NR=107109196A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HISHIDA SHOTA</creatorcontrib><creatorcontrib>TAMAI KAZUSEI</creatorcontrib><creatorcontrib>OTSUKI SHINGO</creatorcontrib><creatorcontrib>ASANO HIROSHI</creatorcontrib><creatorcontrib>ITO YUUICHI</creatorcontrib><creatorcontrib>ASAI MAIKO</creatorcontrib><creatorcontrib>IKEDO TOMOYA</creatorcontrib><title>Polishing composition, polishing method, and method for manufacturing ceramic component</title><description>Provided is a polishing composition which is inexpensive and capable of imparting a high-quality mirror finish to a ceramic. The polishing composition according to the present invention contains abrasive grains, has a pH of 6.0 to 9.0, and is used for polishing a ceramic.
提供廉价且可对陶瓷进行高品质的镜面精加工的研磨用组合物。种研磨用组合物，其含有磨粒，pH为6.0以上且9.0以下，且用于研磨陶瓷。</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>DYES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAgPyM_JLM7IzEtXSM7PLcgvzizJzM_TUSiAC-emlmTkp-goJOalQNkKaflFCrmJeaVpicklpUVgvalFibmZyRAz8lLzSngYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbyzn6GBuaGBpaGlmaMxMWoApvk6fw</recordid><startdate>20170829</startdate><enddate>20170829</enddate><creator>HISHIDA SHOTA</creator><creator>TAMAI KAZUSEI</creator><creator>OTSUKI SHINGO</creator><creator>ASANO HIROSHI</creator><creator>ITO YUUICHI</creator><creator>ASAI MAIKO</creator><creator>IKEDO TOMOYA</creator><scope>EVB</scope></search><sort><creationdate>20170829</creationdate><title>Polishing composition, polishing method, and method for manufacturing ceramic component</title><author>HISHIDA SHOTA ; TAMAI KAZUSEI ; OTSUKI SHINGO ; ASANO HIROSHI ; ITO YUUICHI ; ASAI MAIKO ; IKEDO TOMOYA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN107109196A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>DYES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HISHIDA SHOTA</creatorcontrib><creatorcontrib>TAMAI KAZUSEI</creatorcontrib><creatorcontrib>OTSUKI SHINGO</creatorcontrib><creatorcontrib>ASANO HIROSHI</creatorcontrib><creatorcontrib>ITO YUUICHI</creatorcontrib><creatorcontrib>ASAI MAIKO</creatorcontrib><creatorcontrib>IKEDO TOMOYA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HISHIDA SHOTA</au><au>TAMAI KAZUSEI</au><au>OTSUKI SHINGO</au><au>ASANO HIROSHI</au><au>ITO YUUICHI</au><au>ASAI MAIKO</au><au>IKEDO TOMOYA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Polishing composition, polishing method, and method for manufacturing ceramic component</title><date>2017-08-29</date><risdate>2017</risdate><abstract>Provided is a polishing composition which is inexpensive and capable of imparting a high-quality mirror finish to a ceramic. The polishing composition according to the present invention contains abrasive grains, has a pH of 6.0 to 9.0, and is used for polishing a ceramic.
提供廉价且可对陶瓷进行高品质的镜面精加工的研磨用组合物。种研磨用组合物，其含有磨粒，pH为6.0以上且9.0以下，且用于研磨陶瓷。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING TRANSPORTING |
| title | Polishing composition, polishing method, and method for manufacturing ceramic component |
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