Polishing composition, polishing method, and method for manufacturing ceramic component

Provided is a polishing composition which is inexpensive and capable of imparting a high-quality mirror finish to a ceramic. The polishing composition according to the present invention contains abrasive grains, has a pH of 6.0 to 9.0, and is used for polishing a ceramic. 提供廉价且可对陶瓷进行高品质的镜面精加工的研磨用组合物...

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Bibliographische Detailangaben
Hauptverfasser:	HISHIDA SHOTA, TAMAI KAZUSEI, OTSUKI SHINGO, ASANO HIROSHI, ITO YUUICHI, ASAI MAIKO, IKEDO TOMOYA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	Provided is a polishing composition which is inexpensive and capable of imparting a high-quality mirror finish to a ceramic. The polishing composition according to the present invention contains abrasive grains, has a pH of 6.0 to 9.0, and is used for polishing a ceramic. 提供廉价且可对陶瓷进行高品质的镜面精加工的研磨用组合物。种研磨用组合物，其含有磨粒，pH为6.0以上且9.0以下，且用于研磨陶瓷。