Apparatus for use in direct resistance heating of platinum-containing vessels
The application relates to an apparatus for use in direct resistance heating of platinum-containing vessels. An apparatus for use in controlling a temperature of an oblong-shaped molten glass-carrying vessel, such as a conduit for transporting the molten glass from one location to another location,...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The application relates to an apparatus for use in direct resistance heating of platinum-containing vessels. An apparatus for use in controlling a temperature of an oblong-shaped molten glass-carrying vessel, such as a conduit for transporting the molten glass from one location to another location, by flowing a current through the vessel. The apparatus comprises a metal flange comprising a plurality of electrically-conductive rings that include an inner ring joined to the vessel's exterior wall and an outer ring surrounding the inner ring. The inner ring, for example, may include an outer perimeter that is substantially oblong. In some embodiments the inner ring comprises a notch that aids in making current density more uniform. In some examples the width of the inner ring, excluding the notch, does not substantially vary as a function of angular position relative to the vessel.
本申请涉及用于含铂容器的直接电阻加热的设备。种用于通过使得电流流过容器来控制椭圆形熔融玻璃运载容器(例如,用于将熔融玻璃从个位置运输到另个位置的管道)中的温度的设备。所述设备包括金属凸缘,所述金属凸缘包含多个导电环,所述多个导电环包括与容器的外壁接合的内环以及绕着 |
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