Electrodeposition copper and arsenic removing method achieved by controlling electric potential
The invention discloses an electrodeposition copper and arsenic removing method achieved by controlling electric potential. The method comprises the steps that electrodeposition tanks are arranged in a stepped mode from high to low, 1-2 electrodeposition tanks are arranged on each step, and copper-a...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses an electrodeposition copper and arsenic removing method achieved by controlling electric potential. The method comprises the steps that electrodeposition tanks are arranged in a stepped mode from high to low, 1-2 electrodeposition tanks are arranged on each step, and copper-arsenic-containing liquid before electrodeposition flows into the first highest electrodeposition tank and flows out of the last lowest electrodeposition tank; negative poles and positive poles are hoisted in the electrodeposition tanks which are arranged in the stepped mode according to the principle of homopolar equal distance, and the homopolar distance in one group of electrodeposition tanks is decreased step by step from high to low; the liquid before electrodeposition is fed by the first highest electrodeposition tank, the first several electrodeposition tanks are sequentially filled up with the liquid before electrodeposition, the last 1-2 electrodeposition tanks are filled up with electrodeposition liquid el |
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