Apparatus for and method of supplying target material
An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating. 公开了种EUV光源...
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| creator | BAUMGART PETER MICHAEL ISHIKAWA TETSUYA RAJYAGURU CHIRAG ALGOTS JOHN MARTIN |
| description | An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.
公开了种EUV光源靶材料处理系统，其包括靶材料分配器和靶材料贮存器，其中通过使用感应加热将靶材料贮存器中的固体靶材料转换为液体形式的靶材料。 |
| format | Patent |
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公开了种EUV光源靶材料处理系统，其包括靶材料分配器和靶材料贮存器，其中通过使用感应加热将靶材料贮存器中的固体靶材料转换为液体形式的靶材料。</description><language>chi ; eng</language><subject>GAMMA RAY OR X-RAY MICROSCOPES ; IRRADIATION DEVICES ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; PHYSICS ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170818&DB=EPODOC&CC=CN&NR=107077905A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170818&DB=EPODOC&CC=CN&NR=107077905A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BAUMGART PETER MICHAEL</creatorcontrib><creatorcontrib>ISHIKAWA TETSUYA</creatorcontrib><creatorcontrib>RAJYAGURU CHIRAG</creatorcontrib><creatorcontrib>ALGOTS JOHN MARTIN</creatorcontrib><title>Apparatus for and method of supplying target material</title><description>An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.
公开了种EUV光源靶材料处理系统，其包括靶材料分配器和靶材料贮存器，其中通过使用感应加热将靶材料贮存器中的固体靶材料转换为液体形式的靶材料。</description><subject>GAMMA RAY OR X-RAY MICROSCOPES</subject><subject>IRRADIATION DEVICES</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>PHYSICS</subject><subject>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB1LChILEosKS1WSMsvUkjMS1HITS3JyE9RyE9TKC4tKMipzMxLVyhJLEpPLVHITSxJLcpMzOFhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfHOfoYG5gbm5pYGpo7GxKgBAGyZLUY</recordid><startdate>20170818</startdate><enddate>20170818</enddate><creator>BAUMGART PETER MICHAEL</creator><creator>ISHIKAWA TETSUYA</creator><creator>RAJYAGURU CHIRAG</creator><creator>ALGOTS JOHN MARTIN</creator><scope>EVB</scope></search><sort><creationdate>20170818</creationdate><title>Apparatus for and method of supplying target material</title><author>BAUMGART PETER MICHAEL ; ISHIKAWA TETSUYA ; RAJYAGURU CHIRAG ; ALGOTS JOHN MARTIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN107077905A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>GAMMA RAY OR X-RAY MICROSCOPES</topic><topic>IRRADIATION DEVICES</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>PHYSICS</topic><topic>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</topic><toplevel>online_resources</toplevel><creatorcontrib>BAUMGART PETER MICHAEL</creatorcontrib><creatorcontrib>ISHIKAWA TETSUYA</creatorcontrib><creatorcontrib>RAJYAGURU CHIRAG</creatorcontrib><creatorcontrib>ALGOTS JOHN MARTIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BAUMGART PETER MICHAEL</au><au>ISHIKAWA TETSUYA</au><au>RAJYAGURU CHIRAG</au><au>ALGOTS JOHN MARTIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus for and method of supplying target material</title><date>2017-08-18</date><risdate>2017</risdate><abstract>An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.
公开了种EUV光源靶材料处理系统，其包括靶材料分配器和靶材料贮存器，其中通过使用感应加热将靶材料贮存器中的固体靶材料转换为液体形式的靶材料。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR |
| title | Apparatus for and method of supplying target material |
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