Apparatus for and method of supplying target material

Apparatus for and method of supplying target material

An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating. 公开了种EUV光源...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BAUMGART PETER MICHAEL, ISHIKAWA TETSUYA, RAJYAGURU CHIRAG, ALGOTS JOHN MARTIN
Format: Patent
Sprache:chi ; eng
Schlagworte:
GAMMA RAY OR X-RAY MICROSCOPES
IRRADIATION DEVICES
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
PHYSICS
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:An EUV light source target material handling system Is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating. 公开了种EUV光源靶材料处理系统，其包括靶材料分配器和靶材料贮存器，其中通过使用感应加热将靶材料贮存器中的固体靶材料转换为液体形式的靶材料。