SEMICONDUCTOR DEVICE HAVING MULTI-CHANNEL AND METHOD OF FORMING THE SAME
A semiconductor device includes an isolation pattern on a substrate, the isolation pattern having a lower insulating pattern on the substrate, and a spacer to cover side surfaces of the lower insulating pattern, a vertical structure through the isolation pattern to contact the substrate, the vertica...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A semiconductor device includes an isolation pattern on a substrate, the isolation pattern having a lower insulating pattern on the substrate, and a spacer to cover side surfaces of the lower insulating pattern, a vertical structure through the isolation pattern to contact the substrate, the vertical structure having a first semiconductor layer on the substrate, a lower end of the first semiconductor layer being at a lower level than a lower surface of the isolation pattern, a second semiconductor layer on the first semiconductor layer, and a third semiconductor layer on the second semiconductor layer, and a gate electrode crossing the vertical structure and extending over the isolation pattern.
种半导体器件包括:在衬底上的隔离图案,所述隔离图案具有在衬底上的下部绝缘图案,以及覆盖所述下部绝缘图案的侧表面的间隔物;穿过所述隔离图案以接触衬底的垂直结构,所述垂直结构具有在衬底上的第半导体层,第半导体层的下端在比所述隔离图案的下表面更低的高度,在第半导体层上的第二半导体层,以及在第二半导体层上的第三半导体层;以及与垂直结构交叉且在所述隔离图案上方延伸的栅电极。 |
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