Apparatus and method for nanoprobing of electronic devices

A method for probing a semiconductor device under test (DUT) using a combination of scanning electron microscope (SEM) and nanoprobes, by: obtaining an SEM image of a region of interest (ROI) in the DUT; obtaining a CAD design image of the ROI; registering the CAD design image with the SEM image to...

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Bibliographische Detailangaben
Hauptverfasser: NIV ISRAEL, BENZION RONEN, UKRAINTSEV VLADIMIR
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A method for probing a semiconductor device under test (DUT) using a combination of scanning electron microscope (SEM) and nanoprobes, by: obtaining an SEM image of a region of interest (ROI) in the DUT; obtaining a CAD design image of the ROI; registering the CAD design image with the SEM image to identify contact targets; obtaining a Netlist corresponding to the contact targets and using the Netlist to determine which of the contact targets should be selected as test target; and, navigating nanoprobes to land a nanoprobe on each of the test targets and form electrical contact between the nanoprobe and the respective test target. 种用于使用扫描电子显微镜(SEM)和纳米探针的组合来探测待测半导体器件(DUT)的方法,包括:获得DUT中感兴趣区域(ROI)的SEM图像;获得ROI的CAD设计图像;将CAD设计图像与SEM图像进行配准以识别接触目标;获得对应于接触目标的网表,并使用网表来确定应当选择哪个接触目标作为测试目标;以及对纳米探针导航以使纳米探针落在每个测试目标上并在纳米探针与相应的测试目标之间形成电气接触。